Self-Formation of Ti-Based Barrier Layers in Cu(Ti)/Porous-Low-k Samples

K. Ito; K. Kohama; T. Tanaka; K. Mori; K. Maekawa; Y. Shirai; M. Murakami

doi:https://doi.org/10.7567/SSDM.2009.P-2-1

2009 International Conference on Solid State Devices and Materials

Oct 6, 2009 - Oct 9, 2009
Sendai Kokusai Hotel, Miyagi, Japan

[P-2-1] Self-Formation of Ti-Based Barrier Layers in Cu(Ti)/Porous-Low-k Samples

K. Ito¹, K. Kohama¹, T. Tanaka¹, K. Mori², K. Maekawa², Y. Shirai¹, M. Murakami³ (1.Kyoto Univ.(Japan), 2.Renesas Tech. Corp.(Japan), 3.The Ritsumeikan Trust(Japan))

https://doi.org/10.7567/SSDM.2009.P-2-1

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