[P-2-1] Self-Formation of Ti-Based Barrier Layers in Cu(Ti)/Porous-Low-k Samples

K. Ito¹、K. Kohama¹、T. Tanaka¹、K. Mori²、K. Maekawa²、Y. Shirai¹、M. Murakami³ (1.Kyoto Univ.(Japan)、2.Renesas Tech. Corp.(Japan)、3.The Ritsumeikan Trust(Japan))

https://doi.org/10.7567/SSDM.2009.P-2-1