[P-2-3] Suppression of Fluorine Diffusion into Low-k Material (Methyl-BCN) using Low Temperature Etching

M. Hara¹、T. Masuzumi¹、L. Zhiming¹、C. Kimura¹、H. Aoki¹、T. Sugino¹ (1.Osaka Univ.)

https://doi.org/10.7567/SSDM.2009.P-2-3