[P-2-3] Suppression of Fluorine Diffusion into Low-k Material (Methyl-BCN) using Low Temperature Etching

M. Hara¹, T. Masuzumi¹, L. Zhiming¹, C. Kimura¹, H. Aoki¹, T. Sugino¹ (1.Osaka Univ.)

https://doi.org/10.7567/SSDM.2009.P-2-3