[P-2-7] Impact of film structures on damage to low-k SiOCH film during plasma exposure

S. Yasuhara¹, T. Sasaki¹, K. Tajima², H. Yano², S. Kadomura², M. Yoshimaru², N. Matsunaga², S. Samukawa¹ (1.Tohoku Univ.(Japan), 2.STARC(Japan))

https://doi.org/10.7567/SSDM.2009.P-2-7