[P-2-8] Raman Spectroscopic Metrology for Stress measurement in Semiconductor Device Development and Process

N. Naka¹、S. Kashiwagi¹、K. Ohtsuki¹、J. H. Kim²、C. H. Lee²、S. T. Ahn²、K. H. Bae²、H. W. Yoo²、C. H. Kim² (1.HORIBA, Ltd.(Japan)、2.Hynix Semiconductor Inc.(Korea))

https://doi.org/10.7567/SSDM.2009.P-2-8