The Japan Society of Applied Physics

[P-2-9] Uniaxial Tensile Testing System for Quantitative Stress Analysis in Silicon Oxide Thin Films by Cathodoluminescence Spectroscopy

N. Goami1、N. Yamashita1、N. Araki1、S. Kakinuma2、K. Nishikata2、N. Naka2、K. Matsumoto2、T. Namazu1、S. Inoue1 (1.Univ. of Hyogo(Japan)、2.HORIBA Ltd.(Japan))

https://doi.org/10.7567/SSDM.2009.P-2-9