Uniaxial Tensile Testing System for Quantitative Stress Analysis in Silicon Oxide Thin Films by Cathodoluminescence Spectroscopy

N. Goami; N. Yamashita; N. Araki; S. Kakinuma; K. Nishikata; N. Naka; K. Matsumoto; T. Namazu; S. Inoue

doi:https://doi.org/10.7567/SSDM.2009.P-2-9

[P-2-9] Uniaxial Tensile Testing System for Quantitative Stress Analysis in Silicon Oxide Thin Films by Cathodoluminescence Spectroscopy

N. Goami¹、N. Yamashita¹、N. Araki¹、S. Kakinuma²、K. Nishikata²、N. Naka²、K. Matsumoto²、T. Namazu¹、S. Inoue¹ (1.Univ. of Hyogo(Japan)、2.HORIBA Ltd.(Japan))

https://doi.org/10.7567/SSDM.2009.P-2-9

2009 International Conference on Solid State Devices and Materials

[P-2-9] Uniaxial Tensile Testing System for Quantitative Stress Analysis in Silicon Oxide Thin Films by Cathodoluminescence Spectroscopy