[P-4-1] HAX-PES Study of SiN Film for Charge Storage Layer in High Performance SONOS Type Flash Memory Cell

D. Kosemura^1,4, M. Takei¹, K. Nagata¹, H. Akamatsu¹, M. Hattori¹, D. Katayama¹, T. Nishita², T. Nakanishi², Y. Hirota², M. Machida³, J. Y. Son³, T. Koganezawa³, I. Hirosawa³, A. Ogura¹ (1.Meiji Univ.(Japan), 2.Tokyo Electron Ltd.(Japan), 3.JASRI(Japan), 4.JSPS(Japan))

https://doi.org/10.7567/SSDM.2009.P-4-1