[P-6-10] Stress Analysis in GaN Epilayer after Chemical Mechanical Polishing (CMP) from Sapphire Substrates

Y. K. Su^1,2、C. C. Kao¹、C. L. Lin²、J. J. Chen¹ (1.National Cheng Kung Univ.(Taiwan)、2.Kun-Shan Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-6-10