[P-6-10] Stress Analysis in GaN Epilayer after Chemical Mechanical Polishing (CMP) from Sapphire Substrates

Y. K. Su^1,2, C. C. Kao¹, C. L. Lin², J. J. Chen¹ (1.National Cheng Kung Univ.(Taiwan), 2.Kun-Shan Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-6-10