[P-8-8] Generation Mechanism of Photoemission-assisted Plasma on SiO₂(350 nm)/Si Substrate

T. Kaga¹、S. Ogawa^1,2、H. Hozumi¹、H. Sumi¹、M. Sato^2,3、M. Nihei^2,3、Y. Takakuwa^1,2 (1.Tohoku Univ.(Japan)、2.CREST-JST(Japan)、3.Fujitsu Ltd.(Japan))

https://doi.org/10.7567/SSDM.2009.P-8-8