[P-8-9] Annealing a Ge layer embedded between the SiO₂ and patterned si substrate into crystalline

C. W. Chiu¹、H. J. Huang¹、T. W. Liao¹、J. H. Lin¹、C. H. Kuan¹ (1.National Taiwan Univ.)

https://doi.org/10.7567/SSDM.2009.P-8-9