[P-8-9] Annealing a Ge layer embedded between the SiO₂ and patterned si substrate into crystalline

C. W. Chiu¹, H. J. Huang¹, T. W. Liao¹, J. H. Lin¹, C. H. Kuan¹ (1.National Taiwan Univ.)

https://doi.org/10.7567/SSDM.2009.P-8-9