Raised S/D for Advanced Planar MOSFET devices: Challenges and Applications for the 20nm Node and Beyond

N. Loubet; P. Khare; S. Mehta; S. Ponoth; B. Haren; Q. Liu; K. Cheng; J. Kuss; T. Adam; B. Doris; V. Paruchuri; W. Kleemeier; R. Sampson

doi:https://doi.org/10.7567/SSDM.2010.B-6-2

[B-6-2] Raised S/D for Advanced Planar MOSFET devices: Challenges and Applications for the 20nm Node and Beyond

N. Loubet¹、P. Khare¹、S. Mehta²、S. Ponoth²、B. Haren²、Q. Liu¹、K. Cheng²、J. Kuss²、T. Adam²、B. Doris²、V. Paruchuri²、W. Kleemeier¹、R. Sampson¹ (1.STMicroelectronics、2.IBM , USA)

https://doi.org/10.7567/SSDM.2010.B-6-2

2010 International Conference on Solid State Devices and Materials

[B-6-2] Raised S/D for Advanced Planar MOSFET devices: Challenges and Applications for the 20nm Node and Beyond