[C-4-4L] Qualitative Differences Between Conduction Band Edge Excitonic States and Electron Tapping in (i) SiO₂ and (ii) Si₃N₄ and Si Oxynitride Alloy Films

G. Lucovsky¹ (1.NC State Univ , USA)

https://doi.org/10.7567/SSDM.2010.C-4-4L