[C-7-4] FinFETs Junctions Optimization by Conventional Ion Implantation for (Sub-)22nm Technology Nodes Circuit Applications
A. Veloso1、A. De Keersgieter1、S. Brus1、N. Horiguchi1、P. P. Absil1、T. Hoffmann1
(1.IMEC , Belgium)
https://doi.org/10.7567/SSDM.2010.C-7-4