Ferroelectric-Gate Thin-Film Transistor Fabricated by Total Solution Deposition Process

2010 International Conference on Solid State Devices and Materials

Sep 21, 2010 - Sep 24, 2010
The University of Tokyo, Tokyo, Japan

T. Miyasako¹, B. N. Q. Trinh¹, T. Kaneda¹, M. Onoue¹, P. T. Tue³, E. Tokumitsu^1,2, T. Shimoda^1,3 (1.JST, 2.Tokyo Tech, 3.JAIST , Japan)