The Japan Society of Applied Physics

[E-9-1] Overview and Future Challenges of Hafnium Oxide ReRAM

Y. S. Chen1,2, H. Y. Lee1,2, P. S. Chen3, P. Y. Gu1, Y. Y. Hsu1, W. H. Liu1, C. H. Tsai1, S. M. Wang1, S. S. Sheu1, P. C. Chiang1, W. P. Lin1, W. S. Chen1, F. T. Chen1, C. H. Lien2, M. J. Tsai1 (1.ITRI, 2.National Tsing Hua Univ., 3.Mingshin Univ. of Sci. and Tech. , Taiwan)

https://doi.org/10.7567/SSDM.2010.E-9-1