Overview and Future Challenges of Hafnium Oxide ReRAM

Y. S. Chen; H. Y. Lee; P. S. Chen; P. Y. Gu; Y. Y. Hsu; W. H. Liu; C. H. Tsai; S. M. Wang; S. S. Sheu; P. C. Chiang; W. P. Lin; W. S. Chen; F. T. Chen; C. H. Lien; M. J. Tsai

doi:https://doi.org/10.7567/SSDM.2010.E-9-1

[E-9-1] Overview and Future Challenges of Hafnium Oxide ReRAM

Y. S. Chen^1,2、H. Y. Lee^1,2、P. S. Chen³、P. Y. Gu¹、Y. Y. Hsu¹、W. H. Liu¹、C. H. Tsai¹、S. M. Wang¹、S. S. Sheu¹、P. C. Chiang¹、W. P. Lin¹、W. S. Chen¹、F. T. Chen¹、C. H. Lien²、M. J. Tsai¹ (1.ITRI、2.National Tsing Hua Univ.、3.Mingshin Univ. of Sci. and Tech. , Taiwan)

https://doi.org/10.7567/SSDM.2010.E-9-1

2010 International Conference on Solid State Devices and Materials

[E-9-1] Overview and Future Challenges of Hafnium Oxide ReRAM