[K-8-3] Fabrication of defect-free and relaxed Ge-rich SGOI-wire structures for CMOS applications

M. Oda¹、Y. Moriyama¹、K. Ideda¹、Y. Kamimuta¹、T. Tezuka¹ (1.MIRAI-TOSHIBA , Japan)

https://doi.org/10.7567/SSDM.2010.K-8-3