Strained Si with Smooth and Uniformly Strained Surface Formed by Sputter Epitaxy

H. Hanafusa; N. Hirose; A. Kasamatsu; T. Mimura; T. Matsui; H. M. H. Chong; H. Mizuta; Y. Suda

doi:https://doi.org/10.7567/SSDM.2010.P-1-1

[P-1-1] Strained Si with Smooth and Uniformly Strained Surface Formed by Sputter Epitaxy

H. Hanafusa¹、N. Hirose²、A. Kasamatsu²、T. Mimura²、T. Matsui²、H. M. H. Chong³、H. Mizuta³、Y. Suda¹ (1.Tokyo Univ. of Agri. And Tech.、2.National Inst. of Info. and Commun. Tech. , Japan、3.Univ. of Southampton , UK)

https://doi.org/10.7567/SSDM.2010.P-1-1

2010 International Conference on Solid State Devices and Materials

[P-1-1] Strained Si with Smooth and Uniformly Strained Surface Formed by Sputter Epitaxy