[P-1-16] New Concept of Plasma-induced Damage in MNOS FET during Thick Dielectric Film Etching Using Fluorocarbon Gas Plasma

Y. Ichihashi¹、Y. Ishikawa¹、S. Samukawa¹ (1.Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.P-1-16