[P-1-25L] Fabrication of hp 25nm Si Pillar Using New Multiple Double Patterning Technique

M. Kushibiki^1,4、A. Hara^2,4、E. Nishimura^1,4、T. Endoh^3,4 (1.Tokyo Electron AT Ltd.、2.Tokyo Electron Ltd.、3.Tohoku Univ.、4.JST-CREST , Japan)

https://doi.org/10.7567/SSDM.2010.P-1-25L