[P-2-8] Smooth Patterning of Ru Film by Electrochemical Etching using Organic based Solution

L. Yang¹、R. Sakae¹、M. Yashimaru²、M. Yamaguchi²、I. Kanno²、M. Tanaka²、C. Kimura¹、H. Aoki¹ (1.Osaka Univ.、2.STARC , Japan)

https://doi.org/10.7567/SSDM.2010.P-2-8