Smooth Patterning of Ru Film by Electrochemical Etching using Organic based Solution

2010 International Conference on Solid State Devices and Materials

Sep 21, 2010 - Sep 24, 2010
The University of Tokyo, Tokyo, Japan

L. Yang¹, R. Sakae¹, M. Yashimaru², M. Yamaguchi², I. Kanno², M. Tanaka², C. Kimura¹, H. Aoki¹ (1.Osaka Univ., 2.STARC , Japan)