The Japan Society of Applied Physics

[P-8-16] Degradation Mechanism for CLC Poly-Si n-TFTs under Low Vertical-Field HC Stress with Different Laser Annealing Powers

S. Y. Chang1, M. C. Wang1,2, Z. Y. Hsieh2, C. Chen3 (1.Ming Hsin University of Science & Technology, 2.National Taipei Univ. of Tech., 3.National Chiao Tung Univ. , Taiwan)

https://doi.org/10.7567/SSDM.2010.P-8-16