The Japan Society of Applied Physics

[AL-6-5] Effects of Substrate Defects on the Gate Leakage Current of AlGaN/GaN Heterojunction FETs Fabricated on Na Flux Bulk GaN

R. Hasegawa1, N. Yafune1, H. Tokuda1, Y. Mori3, H. Amano4, M. Kuzuhara1 (1.Univ. of Fukui, 2.Sharp Corp., 3.Osaka Univ., 4.Nagoya Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.AL-6-5