[D-2-1] Current Drive Enhancement of Strained Ge nMISFET with SiGe Stressors by Uniaxial Tensile Stress Y. Kamimuta1, Y. Moriyama1, K. Ikeda1, M. Oda1, T. Tezuka1 (1.MIRAI-Toshiba , Japan) https://doi.org/10.7567/SSDM.2011.D-2-1