[D-2-4] Recovery Characteristic of Anomalous Stress Induced Leakage Current of 5.6nm Oxide Films

T. Inatsuka¹、Y. Kumagai¹、R. Kuroda¹、A. Teramoto¹、S. Sugawa¹、T. Ohmi¹ (1.Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.D-2-4