[D-2-4] Recovery Characteristic of Anomalous Stress Induced Leakage Current of 5.6nm Oxide Films

T. Inatsuka¹, Y. Kumagai¹, R. Kuroda¹, A. Teramoto¹, S. Sugawa¹, T. Ohmi¹ (1.Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.D-2-4