The Japan Society of Applied Physics

[E-9-2] Enabling epitaxy on ultrathin implanted SOI

L. Grenouillet1, N. Possémé1, S. Ponoth2, N. Loubet3, V. Destefanis1, Y. Le Tiec1, S. Mehta2, A. Kumar2, Q. Liu3, B. Haran2, K. Cheng2, N. Berliner2, J. Fullam2, J. Kuss2, G. Shahidi2, O. Faynot1, B. Doris2, M. Vinet1 (1.CEA-LETI , FRANCE, 2.IBM, 3.STMicroelectronics , USA)

https://doi.org/10.7567/SSDM.2011.E-9-2