[E-9-2] Enabling epitaxy on ultrathin implanted SOI
L. Grenouillet1、N. Possémé1、S. Ponoth2、N. Loubet3、V. Destefanis1、Y. Le Tiec1、S. Mehta2、A. Kumar2、Q. Liu3、B. Haran2、K. Cheng2、N. Berliner2、J. Fullam2、J. Kuss2、G. Shahidi2、O. Faynot1、B. Doris2、M. Vinet1
(1.CEA-LETI , FRANCE、2.IBM、3.STMicroelectronics , USA)
https://doi.org/10.7567/SSDM.2011.E-9-2