[G-3-2] Experimental Comparison of Process Variation in 65nm and 180nm CMOS Using Ring Oscillators with Adjustable Delay
T. Ansari1, W. Imafuku1, M. Yasuda1, S. Sasaki1, H. J. Mattausch1, T. Koide1
(1.Hiroshima Univ. , Japan)
https://doi.org/10.7567/SSDM.2011.G-3-2