[G-3-2] Experimental Comparison of Process Variation in 65nm and 180nm CMOS Using Ring Oscillators with Adjustable Delay

T. Ansari¹、W. Imafuku¹、M. Yasuda¹、S. Sasaki¹、H. J. Mattausch¹、T. Koide¹ (1.Hiroshima Univ. , Japan)

https://doi.org/10.7567/SSDM.2011.G-3-2