Kinetics of strain relaxation in lattice-mismatched III-V heteroepitaxy

T. Sasaki; K. Shimomura; H. Suzuki; M. Takahasi; I. Kamiya; Y. Ohshita; M. Yamaguchi

doi:https://doi.org/10.7567/SSDM.2011.L-1-3

2011 International Conference on Solid State Devices and Materials

Sep 27, 2011 - Sep 30, 2011
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

[L-1-3] Kinetics of strain relaxation in lattice-mismatched III-V heteroepitaxy

T. Sasaki¹, K. Shimomura¹, H. Suzuki², M. Takahasi³, I. Kamiya¹, Y. Ohshita¹, M. Yamaguchi¹ (1.Toyota Tech. Inst., 2.Univ. of Miyazaki, 3.JAEA , Japan)

https://doi.org/10.7567/SSDM.2011.L-1-3

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