[M-8-2] High Speed Lateral Crystallization of Amorphous Silicon Films on Glass Substrates by Micro-Thermal-Plasma-Jet Irradiation and Its Application to Thin Film Transistor Fabrication
Y. Fujita1, S. Hayashi1, H. Murakami1, S. Higashi1
(1.Hiroshima Univ. , Japan)
https://doi.org/10.7567/SSDM.2011.M-8-2
