Impact of Zirconia addition for ALD Hafina in HKMG Device Fabricated GF vs. GL

C. K. Chiang; C. H. Wu; H. Y. Huang; J. F. Lin; C. L. Yang; J. Y. Wu; S. J. Wang

doi:https://doi.org/10.7567/SSDM.2011.P-1-18

2011 International Conference on Solid State Devices and Materials

Sep 27, 2011 - Sep 30, 2011
Aichi Industry & Labor Center (WINC AICHI), Nagoya, Japan

[P-1-18] Impact of Zirconia addition for ALD Hafina in HKMG Device Fabricated GF vs. GL

C. K. Chiang^1,3, C. H. Wu², H. Y. Huang¹, J. F. Lin³, C. L. Yang³, J. Y. Wu³, S. J. Wang¹ (1.National Cheng Kung Univ., 2.Chung Hua Univ., 3.United Microelectronics Corp. , Taiwan)

https://doi.org/10.7567/SSDM.2011.P-1-18

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