[P-3-22L] Random Interface-Traps-Induced Characteristic Fluctuation in 16-nm High-k/Metal Gate CMOS Device and Digital Circuit

Y. Y. Chiu¹, Y. Li¹, H. W. Cheng¹ (1.National Chiao Tung Univ. , Taiwan)

https://doi.org/10.7567/SSDM.2011.P-3-22L