[P-3-8] Impact of OFF-state Degradation under Dynamic Stress on Reliability of Nanoscale n-Channel Metal-Oxide-Semiconductor Field-Effect Transistors at Elevated Temperature

N. H. Lee¹, K. J. Kim¹, H. W.Kim², B. K.Kang¹ (1.POSTECH, 2.Samsung Electronics Corp. Ltd. , Korea)

https://doi.org/10.7567/SSDM.2011.P-3-8