[A-2-1] The impacts of ArF Excimer Immersion Lithography on Integrated Silicon Photonics Tech.

H. Takahasi^1,2、M. Toyama^1,3、M. Seki^1,3、D. Shimura^1,2、K. Koshino^1,3、N. Yokoyama^1,3、M. Ohtsuka^1,3、A. Sugiyama^1,3、E. Ishitsuka^1,3、T. Sano^1,3、T. Horikawa^1,3 (1.Inst. for Photonics-Electronics Convergence System Tech.(PECST)、2.Photonics Electronics Tech. Research Association(PETRA)、3.National Inst. of Advanced Industrial Science and Tech.(AIST) , Japan)

https://doi.org/10.7567/SSDM.2012.A-2-1