[D-1-1] Ultimate Scaling of High-k Gate Dielectrics: Current Status and Challenges
T. Ando1, M. M. Martin1, E. A. Cartier1, B. P. Linder1, J. Rozen1, K. Choi2
(1.IBM T. J. Watson Research Center, 2.GLOBALFOUNDRIES , USA)
https://doi.org/10.7567/SSDM.2012.D-1-1
