[D-1-1] Ultimate Scaling of High-k Gate Dielectrics: Current Status and Challenges

T. Ando¹、M. M. Martin¹、E. A. Cartier¹、B. P. Linder¹、J. Rozen¹、K. Choi² (1.IBM T. J. Watson Research Center、2.GLOBALFOUNDRIES , USA)

https://doi.org/10.7567/SSDM.2012.D-1-1