The Japan Society of Applied Physics

[F-1-4] Effective Mobility Enhancement in Al2O3/InSb/Si Quantum Well MOSFETs for Thin InSb Channel Layers

T. Ito1, A. Kadoda1, K. Nakayama1, Y. Yasui1, M. Mori1, K. Maezawa1, E. Miyazaki2, T. Mizutani2 (1.Univ. of Toyama, 2.Nagoya Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.F-1-4