[I-2-7] Scaling of Channel Length for Highly Conductive Silicon Nanocrystal Films

J. F. Susoma¹、Y. Nakamine¹、K. Usami¹、T. Kodera¹、Y. Kawano¹、S. Oda¹ (1.Tokyo Tech. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-7