[I-2-7] Scaling of Channel Length for Highly Conductive Silicon Nanocrystal Films

J. F. Susoma¹, Y. Nakamine¹, K. Usami¹, T. Kodera¹, Y. Kawano¹, S. Oda¹ (1.Tokyo Tech. , Japan)

https://doi.org/10.7567/SSDM.2012.I-2-7