The Japan Society of Applied Physics

[K-4-3] Electrostatic Temporary Bonding Tech. and TSV Formation for Reconfigured Wafer-to-Wafer 3D Integration

H. Hashiguchi1、J. C. Bea2、Y. Ohara1、T. Fukushima2、K. W. Lee2、T. Tanaka1,3、M. Koyanagi2 (1.Dept. of Bioengineering and Robotics, Tohoku Univ.、2.New Industry Creation Hatchery Center , Tohoku Univ.、3.Dept. of Biomedical Engineering, Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.K-4-3