The Japan Society of Applied Physics

[K-4-3] Electrostatic Temporary Bonding Tech. and TSV Formation for Reconfigured Wafer-to-Wafer 3D Integration

H. Hashiguchi1, J. C. Bea2, Y. Ohara1, T. Fukushima2, K. W. Lee2, T. Tanaka1,3, M. Koyanagi2 (1.Dept. of Bioengineering and Robotics, Tohoku Univ., 2.New Industry Creation Hatchery Center , Tohoku Univ., 3.Dept. of Biomedical Engineering, Tohoku Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.K-4-3