[PS-1-13] Multi-Step Deposition and Low-Temperature Two-Step (Ultraviolet Ozone cum Rapid Thermal) Annealing as a Promising Means for Gate-Last High-k/Metal Gate Application

K. S. Yew¹、C. H. Tang¹、D. S. Ang¹ (1.Nanyang Technological Univ. , Singapore)

https://doi.org/10.7567/SSDM.2012.PS-1-13