[PS-1-3] Fabrication of ZrSiO/Ge Gate Stacks with GeO2 and ZrGeO Interlayers

S. Kojima¹, K. Sakamoto¹, Y. Iwamura¹, K. Hirayama¹, K. Yamamoto¹, D. Wang¹, H. Nakashima¹ (1.Kyushu Univ. , Japan)

https://doi.org/10.7567/SSDM.2012.PS-1-3